Polymeric minus filter

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United States of America Patent

PATENT NO 5238738
SERIAL NO

07784367

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A polymeric minus filter for an incident electromagnetic spectral band comprises at least one polymeric interference stack tuned to a predetermined design wavelength centered around .lambda..sub.0, wherein .lambda..sub.0 is in the range of 300 nm to 2000 nm, said filter comprises an optically transparent substrate and having deposited thereon at ambient temperatures (20.degree. to 23.degree. C.) a multiplicity of pairs of polymeric thin interference layers plus one final polymeric layer having index of refraction n.sub.2, each pair of interference layers having a total optical thickness equal to 1/2 wavelength of .lambda..sub.0, the members of each pair having refractive indices n.sub.1 and n.sub.2, respectively, wherein the layer having refractive index n.sub.2 is directly superimposed upon said substrate having refractive index n.sub.s and wherein n.sub.s is approximately equal to n.sub.1, and wherein n.sub.2

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Patent Owner(s)

Patent OwnerAddress
MINNESOTA MINING AND MANUFACUTIRNG COMPANY A CORP OF DEST PAUL MN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miller, Robert H Santa Rosa, CA 60 2163

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