Method for cleaning the surface of a substrate with plasma
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United States of America Patent
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Oct 12, 1993
Grant Date -
N/A
app pub date -
Dec 17, 1991
filing date -
Dec 20, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Method for cleaning, with plasma, the surface of a substrate before another treatment, consisting: in a first cleaning step, in negatively polarizing the substrate and in subjecting it to an argon plasma, and in a second cleaning step, in subjecting the pretreated substrate to a hydrogen plasma, in order to ensure an efficient cleaning of the surface of the substrate. Application to the prior cleaning of a silicon substrate intended to receive an epitaxy.
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