Polish containing silylated derivatives of organic amines and epoxides
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United States of America Patent
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-
Nov 2, 1993
Grant Date -
N/A
app pub date -
May 11, 1992
filing date -
May 11, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A polish formulation containing as components thereof at least one member selected from the group consisting of waxes, solvents, surfactants, film formers, abrasives and other ingredients normally used in making polishes. The improvement resides in incorporating into the polish formulation as a film former a silylated polycycloaliphatic amine or epoxide.
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