Method of producing microstructures having regions of different structural height
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United States of America Patent
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Nov 9, 1993
Grant Date -
N/A
app pub date -
Mar 31, 1992
filing date -
Jul 31, 1990
priority date (Note) -
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Abstract
A method of producing microstructures having regions of different structural height includes providing a layer of positive resist material that is sensitive to X-ray radiation with microstructures on a side facing a source of X-rays. Using a mask, the layer of a positive resist material is partially irradiated with the X-rays. The irradiated regions are removed with the aid of a developer.
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