Compositions and methods for polishing and planarizing surfaces
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United States of America Patent
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-
Nov 23, 1993
Grant Date -
N/A
app pub date -
Apr 27, 1992
filing date -
Apr 27, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An abrasive composition for use in polishing or planarizing the surface of a work piece is provided comprising about 30 to 50 percent of cerium oxide; about 8 to about 20 percent of fumed silica and about 15 to about 45 percent of precipitated silica. Methods using the composition to polish or planarize the surfaces of work pieces, as well as products produced by such methods, are also provided.
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Cited Art Landscape
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