Nanochannel glass matrix used in making mesoscopic structures
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United States of America Patent
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Nov 23, 1993
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N/A
app pub date -
Jun 12, 1992
filing date -
Jun 12, 1992
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Abstract
The present invention provides a method of forming a semiconductor device mprising the steps of: forming a glass block of an acid inert glass having acid etchable glass rods extending therethrough, the acid etchable glass rods having an average diameter of less than 1 micron; partially etching one end of the acid etchable rods surface of the glass block to form cavities in the glass block on one surface thereof having an average diameter of less than 1 micron; depositing material(s) in the cavities to form a semiconductor device. The present invention also provides a method for forming a semiconductor device in which the acid etchable glass rods are completely etched and the deposition material(s) is deposited to fill the nanochannels formed by the etching. The present invention also provides semiconductor devices made by these methods.
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