Method of producing a wafer having a curved notch

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United States of America Patent

PATENT NO 5279992
SERIAL NO

07857648

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Abstract

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A wafer having chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer such as an orientation flatness. The chipping of the wafer can be prevented, and in coating the wafer with a photoresist, forming an epitaxially grown layer on the wafer, etc., films having desired characteristics can be provided on the surface of the wafer.

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Patent Owner(s)

Patent OwnerAddress
HITACHI LTD6-6 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8280

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Egashira, Etuo Yamanashi, JP 4 40
Komoriya, Susumu Tokorozawa, JP 24 299
Maejima, Hisashi Higashiyamato, JP 14 287
Nishizuka, Hiroshi Higashikurume, JP 12 202

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