Method and apparatus for monitoring the processing of a material
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United States of America Patent
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-
Jan 25, 1994
Issued Date -
N/A
app pub date -
Dec 9, 1992
filing date -
Nov 6, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus are provided for determining a process parameter of a material in a processing system having two containers. The material being monitored is disposed in one container and a single thermal energy control device is applied to both containers. The heat flux of each container is determined while the single thermal control device is applied to both containers. The process parameter is determined in accordance with the determined heat flux. The thermal energy control device may be a single heating surface for warming the two containers, or a cooling device such as a refrigerator. The process parameter may be the drying rate of the material and the drying rate can be determined during the processing of the material. The drying rate and the percent of drying can be displayed and the thermal energy level of the containers can be controlled according to the determined drying rate. A calibration procedure for calibrating the apparatus is also provided.
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