High quality oxide films on substrates

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United States of America Patent

PATENT NO 5282903
SERIAL NO

07974455

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Abstract

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A method for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material.

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Patent Owner(s)

Patent OwnerAddress
ASSOCIATED UNIVERSITIES INCWASHINGTON DC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gao, Yong L Henrietta, NY 2 6
Ruckman, Mark W Middle Island, NY 6 45
Strongin, Myron Center Moriches, NY 4 282

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