Multi-chamber integrated process system

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United States of America Patent

PATENT NO 5288379
SERIAL NO

07979255

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Abstract

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A vacuum processing apparatus capable of quickly replacing a substrate without opening the two gate valves simultaneously by using two waiting stages and a single transferring robot. The transferring robot is designed to transfer a substrate in a straight-line direction, and those two holding stages are set up in front of and behind the center of rotation of the baseplate of the transferring robot. An integrated module multi-chamber vacuum processing system is provided including a plurality of processing chambers capable of being vacuum evacuated, a substrate transferring chamber capable of being vacuum evacuated, at least one load-lock chamber capable of being vacuum evacuated, a substrate transferring robot assembly for transferring a substrate between the at least one load-lock chamber and the processing chamber disposed within the substrate transferring chamber. The substrate transferring robot assembly comprises a baseplate rotatable with respect to the substrate transferring chamber, two waiting stages integrated on the baseplate to store the substrate temporarily, and a substrate transferring robot mounted on the baseplate for transferring the substrate.

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Patent Owner(s)

Patent OwnerAddress
ANELVA CORPORATION8-1 YOTSUYA 5-CHOME FUCHU-SHI TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Namiki, Minoru Fuchu, JP 5 102
Takahashi, Nobuyuki Fuchu, JP 316 4437

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