Drain arrangement for photoresist coating apparatus
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United States of America Patent
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-
Feb 22, 1994
Grant Date -
N/A
app pub date -
Jun 26, 1992
filing date -
Jun 26, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A photoresist drainage system for conducting the excess photoresist and solvents from a spin coating machine in a semiconductor fabrication unit is disclosed. The excess photoresist liquid and solvents are channeled directly to an exhaust manifold instead of being collected in a temporary storage tank. From the exhaust manifold the photoresist and solvents flow directly into a factory chemical reclaim system. This substantially reduces the amount of solvent vapors that are drawn into the factory exhaust system.
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