Method for producing ink jet recording head
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United States of America Patent
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-
Mar 1, 1994
Grant Date -
N/A
app pub date -
Dec 1, 1992
filing date -
Dec 3, 1991
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
In the preparation of a ink jet recording head by coating positive photoresist containing naphthoquinone diazide on a substrate, patterning the positive photoresist, then coating a photocurable material for liquid path formation, photocuring said material and dissolving the patterned photoresist thereby forming liquid paths, the patterned positive photoresist is subjected to flush exposure and degassing prior to the coating of the liquid path forming material in order to discharge the bubbles from the photoresist and to prevent eventual deformation of said material by the migrating bubbles generated from the positive photoresist.
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