High finesse holographic fabry-perot etalon and method of fabricating
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United States of America Patent
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Mar 8, 1994
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N/A
app pub date -
Aug 24, 1992
filing date -
Aug 24, 1992
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Abstract
A high finesse holographic Fabry-Perot etalon and method of making a high finesse holographic Fabry-Perot etalon is disclosed. Particularly, a holographic Fabry-Perot etalon which achieves high finesse despite non-flat interfaces between the etalon media is presented. In a preferred method of fabricating a high finesse Fabry-Perot etalon, single step recording of both holograms simultaneously, with the spacer and substrates in place, is employed which preserves full phase synchronization between the holograms. In spite of imperfections or irregularities of the interface surfaces of the substrates or spacers, the holographic fringes in the holograms remain flat even for slightly different refractive indices between the various media. The position and flatness of the fringes remains similar to perfect Fabry-Perot etalon structure.
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