Low resistance contacts for shallow junction semiconductors
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United States of America Patent
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Mar 15, 1994
Grant Date -
N/A
app pub date -
Jun 1, 1992
filing date -
Jun 1, 1992
priority date (Note) -
Expired
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Abstract
A method of enhancing the specific contact resistivity in InP semiconductor devices and improved devices produced thereby are disclosed. Low resistivity values are obtained by using gold ohmic contacts that contain small amounts of gallium or indium and by depositing a thin gold phosphide interlayer between the surface of the InP device and the ohmic contact. When both the thin interlayer and the gold-gallium or gold-indium contact metallizations are used, ultra low specific contact resistivities are achieved. Thermal stability with good contact resistivity is achieved by depositing a layer of refractory metal over the gold phosphide interlayer.
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