Method of implanting ions from a plasma into an object

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United States of America Patent

PATENT NO 5296272
SERIAL NO

08008273

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An object which is to be implemented with ions is enclosed in a container. A plasma is generated in a chamber which is separate from, and opens into the container. The plasma diffuses from the chamber into the container to surround the object with uniform density. High voltage negative pulses are applied to the object, causing the ions to be accelerated from the plasma toward, and be implanted into, the object. Line-of-sight communication between a plasma generation source located in the chamber and the object is blocked, thereby eliminating undesirable effects including heating of the object by the source and transfer of thermally discharged material from the source to the object. Two or more chambers may be provided for generating independent plasmas of different ion species which diffuse into and uniformly mix in the container. The attributes of the different plasmas may be individually selected and controlled in the respective chambers.

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Patent Owner(s)

Patent OwnerAddress
HUGHES ELECTRONICS CORPORATIONP O BOX 956 200 N SEPULVEDA BLVD EL SEGUNDO CA 90245

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goebel, Dan M Tarzana, CA 28 473
Matossian, Jesse N Woodland Hills, CA 20 546

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