Method and apparatus for contamination control in processing apparatus containing voltage driven electrode
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United States of America Patent
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Mar 29, 1994
Grant Date -
N/A
app pub date -
Apr 25, 1990
filing date -
Apr 25, 1990
priority date (Note) -
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Abstract
A process chamber having voltage driven electrodes, e.g. plasma chamber, can be made self cleaning of particle contamination by appropriate design of the workpiece or electrode surface to provide protuberances, grooves or tapers thereon which result in a predetermined pattern in the electrostatic potential within the process chamber which can trap particulate contamination in preselected regions within the plasma chamber. These particles can then be channeled out of the process chamber through a pump port.
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