Method and apparatus for transfer of a reticle pattern onto a substrate by scanning

United States of America Patent

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Mar 29, 1994
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N/A
app pub date
Nov 4, 1991
filing date
Nov 4, 1991

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Expired

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Abstract

A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.

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Patent Owner(s)

Patent Owner	Address
ULTRATECH STEPPER INC	3230 SCOTT BOULEVARD SANTA CLARA CA 95052-8103

International Classification(s)

G03B:APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS O....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Gibson, John A	655 Oneida Dr., Sunnyvale, CA 94087	7	259
Knirck, Jeffrey G	868 Jasmine Dr., Sunnyvale, CA 94086	15	411
Swanson, Paul A	3585 Millet Ct., San Jose, CA 95127	9	310

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Method and apparatus for transfer of a reticle pattern onto a substrate by scanning

Number of patents in Portfolio can not be more than 2000

United States of America Patent

07788146

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PATENT NO	5298939
SERIAL NO	07788146
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07788146

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Abstract

First Claim

Family

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