Method and apparatus for transfer of a reticle pattern onto a substrate by scanning

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United States of America Patent

PATENT NO 5298939
SERIAL NO

07788146

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Abstract

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A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.

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Patent Owner(s)

Patent OwnerAddress
ULTRATECH STEPPER INC3050 ZANKER ROAD SAN JOSE CA 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gibson, John A 655 Oneida Dr., Sunnyvale, CA 94087 7 250
Knirck, Jeffrey G 868 Jasmine Dr., Sunnyvale, CA 94086 15 323
Swanson, Paul A 3585 Millet Ct., San Jose, CA 95127 9 229

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