Method of making atomically sharp tips useful in scanning probe microscopes
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United States of America Patent
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Apr 12, 1994
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N/A
app pub date -
May 15, 1992
filing date -
May 15, 1992
priority date (Note) -
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Abstract
An in situ plasma dry etching process for the formation of atomically sharp tips for use in high resolution microscopes in which i) a mask layer is deposited on a substrate, ii) a photoresist layer is patterned superjacent the mask layer at the sites where the tips are to be formed, iii) the mask is selectively removed by plasma etching, iv) after which the substrate is etched in the same plasma reacting chamber, thereby creating sharp microscope tips.
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