Illumination system for Half-Field Dyson stepper
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United States of America Patent
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-
Apr 12, 1994
Grant Date -
N/A
app pub date -
Dec 21, 1992
filing date -
Dec 21, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An illumination system for use in a unit magnification optical projection system (such as a Half-Field Dyson system) is provided. In a Half-Field Dyson system, a reticle and a wafer are parallel to each other with a window being provided on the reticle to allow for projection of the reticle pattern onto the wafer. The present invention provides uniform bright illumination over the reticle pattern with little or no spill over through the reticle window.
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Cited Art Landscape
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