Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins
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United States of America Patent
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May 3, 1994
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N/A
app pub date -
Nov 6, 1992
filing date -
Nov 6, 1992
priority date (Note) -
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Abstract
Addition of non-nitrogen containing weak acids to amine-containing alkaline strippers for photoresists produce stripper compositions able to strip highly cross-linked or hardened photoresist films without producing any substantial metal corrosion. Weak acids useful in the stripping compositions include those having a pK in aqueous solution of 2.0 or higher and an equivalent weight of less than about 140 and are employed in an amount to neutralize from about 19% to about 75% of the amine present in the stripper composition.
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