Plasma processing apparatus using capacitance manometer and pressure control method thereof
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United States of America Patent
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May 10, 1994
Grant Date -
N/A
app pub date -
Nov 27, 1991
filing date -
Nov 28, 1990
priority date (Note) -
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status (Latency Note)
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Abstract
A pressure gage detects a pressure in a vacuum-processing container as an electrical signal. A pressure detection signal from the pressure gage includes an error over time. An error detecting unit detects a signal representing the error which is output from the pressure gage while the vacuum-processing container is set at a predetermined calibration pressure. A correction value calculating unit calculates, in accordance with the signal representing the error which is detected by the error detecting unit, a signal representing a correction value used in order to cancel the signal representing the error. A correcting unit adds the pressure detection signal from the pressure gage to the signal representing the correction value which is calculated by the correction value calculating unit while an instruction for setting an interior of the vacuum-processing container at a desired pressure value is output, thereby eliminating the error over time which is included in the pressure detection signal. A pressure controlling unit controls the interior of the vacuum-processing container at the desired pressure value in accordance with an output signal from which the error over time has been eliminated by the correcting unit.
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