Apparatus for analysis of particulate material, analytical method for same, apparatus for production of ultrapure water, apparatus for manufacturing of semiconductor, and apparatus for production of pure gas
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United States of America Patent
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May 31, 1994
Grant Date -
N/A
app pub date -
Aug 5, 1991
filing date -
Aug 3, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus and a method for analysis of a particle by irradiation of the particle in a fluid with an intense laser pulse to cause laser breakdown and to detect sonic waves or plasma emission which are generated by the laser breakdown. The size of the particle is measured by using at least two kinds of information from the following: intensity of plasma emission or sonic wave generated by the laser breakdown, location of the laser breakdown plasma, and plasma emission waveform. Also, a laser pulse having flattened distribution of intensity for the irradiation is used in order to eliminate the dependence of the measured value on the particle location.
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