Photochemically stable deep ultraviolet pellicles for excimer lasers
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United States of America Patent
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Sep 6, 1994
Grant Date -
N/A
app pub date -
Aug 27, 1992
filing date -
Aug 27, 1992
priority date (Note) -
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Abstract
An embodiment of the present invention is a pellicle for use on a photomask reticle used in conjunction with deep ultraviolet light wavelengths. The membrane of the pellicle comprises a purified fluoropolymer that has been spin coated on a substrate of nitrocellulose and then separated and mounted on an aluminum frame. The aluminum frame has vents that filter air of contaminants and which allow an equalization of air pressure on both sides of the pellicle membrane when a peel-off backliner is in place on the opposite side of the frame. A permanent bond is made between the membrane and frame and a sticky adhesive is used to keep the backliner on the frame until peel-off. The sticky adhesive is such that the backliner may be re-attached a plurality of times.
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