Microlithographic projection system
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United States of America Patent
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Oct 25, 1994
Grant Date -
N/A
app pub date -
Apr 2, 1993
filing date -
Apr 2, 1993
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In the microlithographic projection system disclosed herein, a reticle whose image is to be projected is illuminated with light having an essentially uniform intensity distribution over the reticle and angular distribution which is annularly concentrated. The annular concentration is produced by a phase grating interposed between the light source and a kaleidoscope which generates multiple overlapping images of this light source. The grating employs an array of elements of differing transmission phasings which suppresses zero order transmission and concentrates incident energy in an annularly diverging beam array.
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