US Patent No: 5,361,449

Number of patents in Portfolio can not be more than 2000

Cleaning apparatus for cleaning reverse surface of semiconductor wafer

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ATTORNEY / AGENT: (SPONSORED)
 

Importance

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Abstract

A cleaning apparatus for cleaning the reverse surface of a semiconductor wafer has a pair of holders for holding the wafer therebetween such that the wafer is kept substantially horizontal with the major surface directed upward. The holders can be moved close to each other and away from each other in the horizontal direction, and be moved in the vertical direction. A rotary brush is brought into contact with the reverse surface of the wafer held between the holders. The rotary brush can be rotated about its center, and be revolved substantially about the center of the wafer. The shaft of the brush is connected to a flexible pipe. Pure water as cleaning water and drying nitrogen gas of about 200.degree. C. are selectively supplied to the reverse surface of the wafer through the flexible pipe. Cleaning nitrogen gas as a barrier gas is supplied to the major surface of the wafer so as to prevent a contaminant from being scattered from the reverse surface and attached to the major surface.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO5116

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akimoto, Masami Kumamoto, JP 106 2313

Cited Art

Patent Info (Count) # Cites Year
 
DAINIPPON SCREEN MFG. CO., LTD. (2)
4,871,417 Method and apparatus for surface treating of substrates 105 1987
5,209,180 Spin coating apparatus with an upper spin plate cleaning nozzle 54 1992
 
FSI INTERNATIONAL, INC. (1)
5,169,408 Apparatus for wafer processing with in situ rinse 135 1990

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
LAM RESEARCH CORPORATION (30)
6,230,753 Wafer cleaning apparatus 12 1998
6,143,089 Method of cleaning semiconductor wafers and other substrates 6 1998
6,277,203 Method and apparatus for cleaning low K dielectric and metal wafer surfaces 17 1998
6,711,775 System for cleaning a semiconductor wafer 3 1999
6,405,399 Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing 6 1999
6,345,404 Wafer cleaning apparatus 11 1999
6,319,330 Method and apparatus for cleaning low K dielectric and metal wafer surfaces 5 2000
7,234,477 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces 12 2002
7,240,679 System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold 4 2002
7,198,055 Meniscus, vacuum, IPA vapor, drying manifold 7 2002
7,153,400 Apparatus and method for depositing and planarizing thin films of semiconductor wafers 14 2003
7,264,007 Method and apparatus for cleaning a substrate using megasonic power 1 2003
7,353,560 Proximity brush unit apparatus and method 1 2003
8,062,471 Proximity head heating method and apparatus 1 2004
7,045,018 Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same 3 2004
7,614,411 Controls of ambient environment during wafer drying using proximity head 0 2004
7,513,262 Substrate meniscus interface and methods for operation 1 2004
7,389,783 Proximity meniscus manifold 5 2004
7,293,571 Substrate proximity processing housing and insert for generating a fluid meniscus 2 2004
7,367,345 Apparatus and method for providing a confined liquid for immersion lithography 8 2004
8,236,382 Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same 0 2004
7,383,843 Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer 4 2004
7,675,000 System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology 0 2004
7,632,376 Method and apparatus for atomic layer deposition (ALD) in a proximity system 3 2005
7,928,366 Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access 0 2006
7,975,708 Proximity head with angled vacuum conduit system, apparatus and method 0 2007
8,146,902 Hybrid composite wafer carrier for wet clean equipment 0 2007
8,141,566 System, method and apparatus for maintaining separation of liquids in a controlled meniscus 0 2007
7,997,288 Single phase proximity head having a controlled meniscus for treating a substrate 0 2007
7,503,983 Methods of proximity head brushing 0 2008
 
APPLIED MATERIALS, INC. (21)
5,972,127 Methods for centrifugally cleaning wafer carriers 16 1997
6,350,319 Micro-environment reactor for processing a workpiece 26 1998
6,318,385 Micro-environment chamber and system for rinsing and drying a semiconductor workpiece 12 1998
6,125,863 Offset rotor flat media processor 15 1998
6,062,239 Cross flow centrifugal processor 8 1998
6,432,214 Cleaning apparatus 6 1998
6,264,752 Reactor for processing a microelectronic workpiece 25 1998
6,352,595 Method and system for cleaning a chemical mechanical polishing pad 8 1999
6,423,642 Reactor for processing a semiconductor wafer 31 1999
6,413,436 Selective treatment of the surface of a microelectronic workpiece 24 1999
6,632,292 Selective treatment of microelectronic workpiece surfaces 14 2000
6,800,020 Web-style pad conditioning system and methods for implementing the same 1 2000
7,264,698 Apparatus and methods for electrochemical processing of microelectronic workpieces 4 2001
7,102,763 Methods and apparatus for processing microelectronic workpieces using metrology 6 2001
6,680,253 Apparatus for processing a workpiece 3 2001
6,548,411 Apparatus and methods for processing a workpiece 11 2001
6,511,914 Reactor for processing a workpiece using sonic energy 4 2001
6,492,284 Reactor for processing a workpiece using sonic energy 6 2001
7,090,751 Apparatus and methods for electrochemical processing of microelectronic workpieces 0 2002
7,399,713 Selective treatment of microelectric workpiece surfaces 8 2003
7,217,325 System for processing a workpiece 2 2004
 
SEMITOOL, INC. (15)
5,562,113 Centrifugal wafer carrier cleaning apparatus 20 1995
5,738,128 Centrifugal wafer carrier cleaning apparatus 20 1996
6,375,741 Semiconductor processing spray coating apparatus 10 2000
6,447,633 Reactor for processing a semiconductor wafer 3 2000
6,558,470 Reactor for processing a microelectronic workpiece 2 2001
6,446,643 Micro-environment chamber and system for rinsing and drying a semiconductor workpiece 6 2001
6,997,988 System for processing a workpiece 0 2001
6,695,914 System for processing a workpiece 5 2001
6,666,922 System for processing a workpiece 1 2001
6,660,098 System for processing a workpiece 2 2001
6,494,956 System for processing a workpiece 2 2001
6,543,156 Method and apparatus for high-pressure wafer processing and drying 6 2002
7,267,749 Workpiece processor having processing chamber with improved processing fluid flow 2 2003
7,566,386 System for electrochemically processing a workpiece 0 2004
7,438,788 Apparatus and methods for electrochemical processing of microelectronic workpieces 0 2005
 
TOKYO ELECTRON LIMITED (5)
5,518,542 Double-sided substrate cleaning apparatus 123 1994
5,651,160 Cleaning apparatus for cleaning substrates 42 1996
5,928,390 Vertical processing apparatus 19 1997
5,858,112 Method for cleaning substrates 26 1997
6,027,262 Resist process method and system 12 1997
 
UNITED MICROELECTRONICS CORP. (4)
6,283,134 Apparatus for removing photo-resist 1 1998
6,295,683 Equipment for brushing the underside of a semiconductor wafer 1 1999
6,286,178 Jet cleaning device for developing station 0 2000
6,289,550 Jet cleaning device for developing station 3 2000
 
AKRION SYSTEMS LLC (3)
7,938,131 Apparatus for ejecting fluid onto a substrate and system and method incorporating the same 0 2007
7,518,288 System for megasonic processing of an article 3 2007
8,343,287 Apparatus for ejecting fluid onto a substrate and system and method incorporating the same 0 2011
 
MICRON TECHNOLOGY, INC. (3)
6,076,217 Brush alignment platform 2 1998
6,330,729 Brush alignment platform 0 2000
6,331,213 Brush alignment method 1 2000
 
ADVANCED MICRO DEVICES, INC. (2)
5,966,766 Apparatus and method for cleaning semiconductor wafer 5 1997
6,110,294 Apparatus and method for cleaning semiconductor wafer 1 1998
 
EBARA CORPORATION (2)
5,868,866 Method of and apparatus for cleaning workpiece 68 1996
5,966,765 Cleaning apparatus 20 1997
 
OKI SEMICONDUCTOR CO., LTD. (2)
5,806,138 Cleaning apparatus for cleaning a semiconductor wafer 7 1996
6,059,893 Method for cleaning a semiconductor wafer 23 1998
 
CANON KABUSHIKI KAISHA (1)
5,706,843 Substrate rotating device 35 1996
 
DAINIPPON SCREEN MFG. CO., LTD. (1)
6,286,525 Substrate cleaning apparatus and method 17 1998
 
GOLDFINGER TECHNOLOGIES, LLC (1)
8,257,505 Method for megasonic processing of an article 0 2011
 
HITACHI, LTD. (1)
6,643,893 Apparatus for cleaning semiconductor wafers in a vacuum environment 2 2001
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
5,956,791 Epicycloidal brushing system 6 1997
 
KABUSHIKI KAISHA TOSHIBA (1)
6,021,789 Wafer cleaning system with progressive megasonic wave 17 1998
 
NIKON CORPORATION (1)
5,634,231 Semiconductor manufacturing apparatus 1 1995
 
PRE-TECH CO., LTD. (1)
5,927,305 Cleaning apparatus 16 1997
 
OTHER [CHECK PATENT PROFILE FOR ASSIGNMENT INFORMATION] (2)
5,933,902 Wafer cleaning system 33 1997
6,082,377 Vertical wafer cleaning and drying system 23 1999