Cleaning apparatus for cleaning reverse surface of semiconductor wafer

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5361449
SERIAL NO

08130464

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A cleaning apparatus for cleaning the reverse surface of a semiconductor wafer has a pair of holders for holding the wafer therebetween such that the wafer is kept substantially horizontal with the major surface directed upward. The holders can be moved close to each other and away from each other in the horizontal direction, and be moved in the vertical direction. A rotary brush is brought into contact with the reverse surface of the wafer held between the holders. The rotary brush can be rotated about its center, and be revolved substantially about the center of the wafer. The shaft of the brush is connected to a flexible pipe. Pure water as cleaning water and drying nitrogen gas of about 200.degree. C. are selectively supplied to the reverse surface of the wafer through the flexible pipe. Cleaning nitrogen gas as a barrier gas is supplied to the major surface of the wafer so as to prevent a contaminant from being scattered from the reverse surface and attached to the major surface.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO5225

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akimoto, Masami Kumamoto, JP 99 2851

Cited Art Landscape

Patent Info (Count) # Cites Year
 
DAINIPPON SCREEN MFG. CO., LTD. (2)
* 4871417 Method and apparatus for surface treating of substrates 111 1987
* 5209180 Spin coating apparatus with an upper spin plate cleaning nozzle 57 1992
 
FSI INTERNATIONAL, INC. (1)
* 5169408 Apparatus for wafer processing with in situ rinse 149 1990
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
* 5956791 Epicycloidal brushing system 8 1997
 
SCREEN HOLDINGS CO., LTD. (1)
* 6286525 Substrate cleaning apparatus and method 20 1998
 
Other [Check patent profile for assignment information] (5)
* 5933902 Wafer cleaning system 36 1997
* 6082377 Vertical wafer cleaning and drying system 26 1999
* 2005/0061,676 System for electrochemically processing a workpiece 4 2004
* 2005/0217,707 Selective processing of microelectronic workpiece surfaces 4 2005
* 2005/0233,589 Processes for removing residue from a workpiece 1 2005
 
NIKON CORPORATION (1)
* 5634231 Semiconductor manufacturing apparatus 1 1995
 
ADVANCED MICRO DEVICES, INC. (2)
* 5966766 Apparatus and method for cleaning semiconductor wafer 6 1997
* 6110294 Apparatus and method for cleaning semiconductor wafer 1 1998
 
LAM RESEARCH CORPORATION (49)
6230753 Wafer cleaning apparatus 13 1998
* 6143089 Method of cleaning semiconductor wafers and other substrates 9 1998
6277203 Method and apparatus for cleaning low K dielectric and metal wafer surfaces 19 1998
6711775 System for cleaning a semiconductor wafer 5 1999
6405399 Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing 8 1999
6345404 Wafer cleaning apparatus 11 1999
6319330 Method and apparatus for cleaning low K dielectric and metal wafer surfaces 7 2000
7234477 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces 28 2002
* 2004/0069,329 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces 10 2002
7240679 System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold 6 2002
7198055 Meniscus, vacuum, IPA vapor, drying manifold 21 2002
* 2004/0060,573 System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold 5 2002
* 2004/0060,580 Meniscus, vacuum, IPA vapor, drying manifold 7 2002
7153400 Apparatus and method for depositing and planarizing thin films of semiconductor wafers 17 2003
* 2004/0178,060 Apparatus and method for depositing and planarizing thin films of semiconductor wafers 4 2003
7264007 Method and apparatus for cleaning a substrate using megasonic power 2 2003
* 2004/0069,319 Method and apparatus for cleaning a substrate using megasonic power 12 2003
7353560 Proximity brush unit apparatus and method 1 2003
* 2005/0132,515 Proximity brush unit apparatus and method 9 2003
8062471 Proximity head heating method and apparatus 2 2004
7045018 Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same 3 2004
* 2005/0221,621 Proximity head heating method and apparatus 9 2004
* 2005/0155,629 Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same 1 2004
7614411 Controls of ambient environment during wafer drying using proximity head 0 2004
7513262 Substrate meniscus interface and methods for operation 7 2004
7389783 Proximity meniscus manifold 15 2004
7293571 Substrate proximity processing housing and insert for generating a fluid meniscus 2 2004
7367345 Apparatus and method for providing a confined liquid for immersion lithography 25 2004
8236382 Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same 0 2004
7383843 Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer 14 2004
* 2005/0158,473 Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same 4 2004
* 2005/0145,265 Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer 111 2004
7675000 System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology 0 2004
* 2006/0088,982 System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology 5 2004
7632376 Method and apparatus for atomic layer deposition (ALD) in a proximity system 5 2005
7928366 Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access 2 2006
* 2008/0083,883 Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access 1 2006
8464736 Reclaim chemistry 0 2007
7975708 Proximity head with angled vacuum conduit system, apparatus and method 0 2007
* 2009/0145,464 Proximity head with angled vacuum conduit system, apparatus and method 1 2007
8146902 Hybrid composite wafer carrier for wet clean equipment 0 2007
* 2008/0152,922 HYBRID COMPOSITE WAFER CARRIER FOR WET CLEAN EQUIPMENT 0 2007
8141566 System, method and apparatus for maintaining separation of liquids in a controlled meniscus 0 2007
* 2008/0314,422 System, method and apparatus for maintaining separation of liquids in a controlled meniscus 3 2007
7997288 Single phase proximity head having a controlled meniscus for treating a substrate 0 2007
* 2008/0266,367 SINGLE PHASE PROXIMITY HEAD HAVING A CONTROLLED MENISCUS FOR TREATING A SUBSTRATE 5 2007
* 7503983 Methods of proximity head brushing 0 2008
* 2008/0105,277 Methods of proximity head brushing 3 2008
8580045 Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer 0 2011
 
LAM RESEARCH AG (1)
* 2012/0286,481 DEVICE AND PROCESS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES 0 2011
 
MICRON TECHNOLOGY, INC. (4)
* 6076217 Brush alignment platform 3 1998
6330729 Brush alignment platform 6 2000
6331213 Brush alignment method 1 2000
* 2004/0159,333 Spindle chuck cleaner 1 2004
 
DAINIPPON SCREEN MFG. CO., LTD. (1)
* 2008/0083,501 SUBSTRATE PROCESSING APPARATUS 4 2007
 
EBARA CORPORATION (2)
* 5868866 Method of and apparatus for cleaning workpiece 69 1996
* 5966765 Cleaning apparatus 23 1997
 
OEM GROUP, LLC (2)
* 6062239 Cross flow centrifugal processor 10 1998
6432214 Cleaning apparatus 8 1998
 
HITACHI, LTD. (2)
* 6643893 Apparatus for cleaning semiconductor wafers in a vacuum environment 3 2001
* 2002/0092,121 Dry cleaning apparatus 0 2001
 
GOLDFINGER TECHNOLOGIES, LLC (2)
8257505 Method for megasonic processing of an article 1 2011
8771427 Method of manufacturing integrated circuit devices 0 2012
 
Semitool, Inc. (16)
* 5562113 Centrifugal wafer carrier cleaning apparatus 24 1995
* 5738128 Centrifugal wafer carrier cleaning apparatus 25 1996
* 6375741 Semiconductor processing spray coating apparatus 11 2000
6447633 Reactor for processing a semiconductor wafer 3 2000
6558470 Reactor for processing a microelectronic workpiece 2 2001
6446643 Micro-environment chamber and system for rinsing and drying a semiconductor workpiece 6 2001
6997988 System for processing a workpiece 0 2001
6695914 System for processing a workpiece 5 2001
6666922 System for processing a workpiece 1 2001
6660098 System for processing a workpiece 2 2001
6494956 System for processing a workpiece 2 2001
* 2001/0050,060 System for processing a workpiece 0 2001
6543156 Method and apparatus for high-pressure wafer processing and drying 7 2002
7267749 Workpiece processor having processing chamber with improved processing fluid flow 4 2003
7566386 System for electrochemically processing a workpiece 1 2004
7438788 Apparatus and methods for electrochemical processing of microelectronic workpieces 1 2005
 
UNITED MICROELECTRONICS CORP. (4)
* 6283134 Apparatus for removing photo-resist 1 1998
* 6295683 Equipment for brushing the underside of a semiconductor wafer 5 1999
* 6286178 Jet cleaning device for developing station 0 2000
* 6289550 Jet cleaning device for developing station 3 2000
 
APPLIED MATERIALS, INC. (21)
* 5972127 Methods for centrifugally cleaning wafer carriers 19 1997
6350319 Micro-environment reactor for processing a workpiece 27 1998
* 6318385 Micro-environment chamber and system for rinsing and drying a semiconductor workpiece 12 1998
* 6125863 Offset rotor flat media processor 17 1998
6264752 Reactor for processing a microelectronic workpiece 26 1998
6352595 Method and system for cleaning a chemical mechanical polishing pad 8 1999
6423642 Reactor for processing a semiconductor wafer 31 1999
6413436 Selective treatment of the surface of a microelectronic workpiece 26 1999
6632292 Selective treatment of microelectronic workpiece surfaces 16 2000
6800020 Web-style pad conditioning system and methods for implementing the same 2 2000
7264698 Apparatus and methods for electrochemical processing of microelectronic workpieces 7 2001
7102763 Methods and apparatus for processing microelectronic workpieces using metrology 8 2001
6680253 Apparatus for processing a workpiece 12 2001
6548411 Apparatus and methods for processing a workpiece 11 2001
6511914 Reactor for processing a workpiece using sonic energy 4 2001
6492284 Reactor for processing a workpiece using sonic energy 6 2001
* 2002/0096,195 Method and apparatus for critical flow particle removal 6 2002
7090751 Apparatus and methods for electrochemical processing of microelectronic workpieces 3 2002
7399713 Selective treatment of microelectric workpiece surfaces 11 2003
7217325 System for processing a workpiece 2 2004
* 2004/0241,998 System for processing a workpiece 1 2004
 
KABUSHIKI KAISHA TOSHIBA (1)
* 6021789 Wafer cleaning system with progressive megasonic wave 21 1998
 
AKRION SYSTEMS LLC (5)
7938131 Apparatus for ejecting fluid onto a substrate and system and method incorporating the same 2 2007
* 2008/0178,911 APPARATUS FOR EJECTING FLUID ONTO A SUBSTRATE AND SYSTEM AND METHOD INCORPORATING THE SAME 1 2007
7518288 System for megasonic processing of an article 5 2007
8343287 Apparatus for ejecting fluid onto a substrate and system and method incorporating the same 0 2011
* 2011/0214,700 APPARATUS FOR EJECTING FLUID ONTO A SUBSTRATE AND SYSTEM AND METHOD OF INCORPORATING THE SAME 1 2011
 
LAPIS SEMICONDUCTOR CO., LTD. (1)
* 5806138 Cleaning apparatus for cleaning a semiconductor wafer 8 1996
 
Pre-Tech Co., Ltd. (1)
* 5927305 Cleaning apparatus 20 1997
 
TOKYO ELECTRON LIMITED (8)
* 5518542 Double-sided substrate cleaning apparatus 145 1994
* 5651160 Cleaning apparatus for cleaning substrates 45 1996
* 5928390 Vertical processing apparatus 28 1997
* 5858112 Method for cleaning substrates 26 1997
* 6027262 Resist process method and system 20 1997
* 8578953 Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium 1 2007
* 8545119 Substrate cleaning apparatus, coating and developing apparatus having the same and substrate cleaning method 0 2011
* 2012/0014,689 SUBSTRATE CLEANING APPARATUS, COATING AND DEVELOPING APPARATUS HAVING THE SAME AND SUBSTRATE CLEANING METHOD 7 2011
 
SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. (1)
* 2009/0071,940 MULTI-SPEED SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 2 2008
 
CANON KABUSHIKI KAISHA (1)
* 5706843 Substrate rotating device 38 1996
 
OKI SEMICONDUCTOR CO., LTD. (1)
* 6059893 Method for cleaning a semiconductor wafer 24 1998
* Cited By Examiner