Photolithography exposure tool and method for in situ photoresist measurments and exposure control
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United States of America Patent
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Nov 8, 1994
Grant Date -
N/A
app pub date -
Jul 29, 1993
filing date -
Jul 29, 1993
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus and method is provided for measuring photoresist parameters in situ is disclosed. Transmission and reflectivity detectors are used in a lithographic exposure tool to obtain in situ absorption parameters and reflectivity data. The absorption parameters and reflectivity data are used in a feedback control system that controls the exposure dose used in the lithographic tool.
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