Importance

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Abstract

Apparatus for a sequential continuous vapor deposition process provides a plurality of physically separated process environments in a single reactor vessel. A substrate mounting plate within the reactor vessel movably positions a substrate mounted thereon sequentially between the plurality of separated process environments. Each of the process environments are defined by a gas emitter structure for emitting a predetermined gas from a source thereof to the environment adjacent to the substrate when it is moved into position adjacent thereto and an exhaust structure through which the gas flows from the environment. A substrate positioning structure movably positions the substrate mounting plate so that the substrate is thereby sequentially passed through each one of the process environments. A vacuum pump between the chamber and an external exhaust environment produces a negative pressure within the reactor vessel relative to pressures at the plural gas emitters to maintain physical separation of gases flowing within the plurality of separated process environments.

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First Claim