Gas supplying system and gas supplying apparatus
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United States of America Patent
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Nov 29, 1994
Grant Date -
N/A
app pub date -
Jan 28, 1993
filing date -
Jan 29, 1992
priority date (Note) -
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Abstract
A gas supplying system for supplying a corrosive gas or the like to a semiconductor manufacturing apparatus or the like. A plurality of kinds of component gases are introduced into a chamber and mixed therein to form a desired supply gas. After supplying the desired supply gas, the chamber is evacuated and an inert gas is charged into the chamber to substitute a residual supply gas remaining in the chamber by the inert gas. The evacuation of the chamber and the charging of the inert gas into the chamber are repeated two or more times. Accordingly, the residual supply gas can be efficiently removed from the chamber and substituted by the inert gas.
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