Method of manufacturing a chemically adsorbed film

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United States of America Patent

PATENT NO 5372851
SERIAL NO

07984478

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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This invention aims to form uniformly and effectively an ultra thin chemical adsorbing film having an excellent water repellent property, oil repellent property, and contamination-proof property on the surface of a substrate by chemically adsorbing in a gas phase atmosphere. A chemically adsorbed film can be formed on any type of substrate and in a short time by chemically adsorbing a chlorosilane based surface-active agent on the surface of a substrate having active hydrogen groups. Further, a chemically adsorbed monomolecular film, or a polymer film, can be formed on any type of substrate and in a short time by forming a siloxane based monomolecular film or a polysiloxane adsorbed film in a gas atmosphere having a chlorosilane based surface-active agent having plurality of chlorosilyl groups.

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Patent Owner(s)

Patent OwnerAddress
MATSUSHITA ELECTRIC INDUSTRIAL CO LTDOSAKA JAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Higashino, Hidetaka Soraku, JP 44 567
Mino, Norihisa Settu, JP 131 1238
Ogawa, Kazufumi Hirakata, JP 255 7089
Soga, Mamoru Osaka, JP 93 1282

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