Plasma jet CVD apparatus for forming diamond films
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United States of America Patent
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Jan 17, 1995
Issued Date -
N/A
app pub date -
Jul 28, 1993
filing date -
Aug 3, 1990
priority date (Note) -
Expired
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Abstract
An apparatus for depositing a diamond film on a substrate includes a first electrode formed as an enclosed body having a nozzle for jetting thermal plasma opening therefrom and a second electrode of opposite polarity positioned in the nozzle. The apparatus additionally includes a power source for applying a direct current voltage between the electrodes. A gas is fed between the electrodes as a direct current voltage is applied thereto, whereby the gas is formed into a thermal plasma which is jetted through the nozzle. A starting gas feed system is included for feeding gaseous starting compounds for vapor phase deposition to the plasma jet and a powder supplying pipe is provided for feeding a metal powder between the electrodes.
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