Method for cleaning semiconductor products
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United States of America Patent
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Jan 17, 1995
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N/A
app pub date -
Aug 30, 1993
filing date -
Feb 27, 1991
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Abstract
The invention relates to a method for cleaning a semiconductor product of particles accumulated on its surface and of metallic and organic contamination. According to the invention, the washing of the semiconductor product is carried out with an acid-water solution with a dilution ratio between 1:10.sup.6 -1:10.sup.3 advantageously between 1:10.sup.5 -1.0.sup.4. Advantageously the employed acid is for instance hydrochloric acid, nitric acid, acetic acid or hydrofluoric acid.
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