Etching liquid for aluminium, method of etching aluminium and etched aluminium product
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United States of America Patent
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-
Feb 7, 1995
Grant Date -
N/A
app pub date -
Oct 6, 1992
filing date -
Oct 9, 1991
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Aluminum is etched with an etching liquid comprising an aqueous solution containing a hydrofluoride of an aliphatic primary, secondary or tertiary amine of a formula: R.sub.1 --N(R.sub.3)--R.sub.2 where R.sub.1, R.sub.2 and R.sub.3 each represent H or an alkyl group, provided that at least one of R.sub.1, R.sub.2 and R.sub.3 is an alkyl group and that the total of carbon atoms in R.sub.1, R.sub.2 and R.sub.3 is 12 or less, and an oxidizing agent, to form a fine etched pattern which is not inferior to a pattern to be formed by copper etching.
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