Gas anti-solvent recrystallization and application for the separation and subsequent processing of RDX and HMX
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United States of America Patent
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Feb 14, 1995
Grant Date -
N/A
app pub date -
May 20, 1992
filing date -
May 20, 1992
priority date (Note) -
Expired
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Abstract
Disclosed is a process for recrystallizing materials that are ordinarily difficult-to-comminute. The process utilizes supercritical fluids and gasses at conditions near their respective vapor pressures which have the ability to dissolve in and expand liquid solutions. The process has been shown to be particularly effective at separating HMX and RDX thereby resulting in a precipitate of RDX which is essentially free of HMX.
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