US Patent No: 5,393,624

Number of patents in Portfolio can not be more than 2000

Method and apparatus for manufacturing a semiconductor device

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Importance

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Abstract

A method of manufacturing a semiconductor device of this invention relates to a method of manufacturing a semiconductor device with ultra-micropattern electrodes. Light is projected on a resist film, and reflected light from a region on which no semiconductor chip is formed, i.e., a flat region is detected to measure the thickness of the resist film. Based on the measured thickness, at least one of the resist film forming step, the exposing step, and the developing step is controlled, so that the electrodes have a desired width.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO5116

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ushijima, Mitsuru Tokyo, JP 14 533

Cited Art

Patent Info (Count) # Cites Year
 
AT & T TECHNOLOGIES, INC., (1)
4,285,433 Method and apparatus for removing dice from a severed wafer 18 1979
 
ELECTRONIC INSTRUMENTATION & TECHNOLOGY, INC. (1)
4,841,156 Measurement of the thickness of thin films 23 1987
 
GEL-PAK, LLC (1)
4,778,326 Method and means for handling semiconductor and similar electronic devices 79 1983
 
HITACHI, LTD. (1)
4,738,910 Method of applying a resist 9 1986
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
5,220,405 Interferometer for in situ measurement of thin film thickness changes 47 1991
 
SC TECHNOLOGY, INC. (1)
4,977,330 In-line photoresist thickness monitor 31 1989
 
TEXAS INSTRUMENTS INCORPORATED (1)
4,851,311 Process for determining photoresist develop time by optical transmission 73 1987
 
TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (1)
4,500,615 Wafer exposure method and apparatus 17 1982

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
KLA-TENCOR TECHNOLOGIES CORPORATION (24)
7,349,090 Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography 2 2001
7,196,782 Methods and systems for determining a thin film characteristic and an electrical property of a specimen 13 2001
7,139,083 Methods and systems for determining a composition and a thickness of a specimen 38 2001
7,130,029 Methods and systems for determining an adhesion characteristic and a thickness of a specimen 10 2001
7,106,425 Methods and systems for determining a presence of defects and a thin film characteristic of a specimen 17 2001
7,006,235 Methods and systems for determining overlay and flatness of a specimen 20 2001
6,950,196 Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen 18 2001
6,946,394 Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process 16 2001
6,919,957 Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen 34 2001
6,917,419 Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen 21 2001
6,917,433 Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process 28 2001
6,891,610 Methods and systems for determining an implant characteristic and a presence of defects on a specimen 19 2001
6,891,627 Methods and systems for determining a critical dimension and overlay of a specimen 57 2001
6,829,559 Methods and systems for determining a presence of macro and micro defects on a specimen 34 2001
6,806,951 Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen 27 2001
6,782,337 Methods and systems for determining a critical dimension an a presence of defects on a specimen 40 2001
6,694,284 Methods and systems for determining at least four properties of a specimen 78 2001
6,673,637 Methods and systems for determining a presence of macro defects and overlay of a specimen 58 2001
6,633,831 Methods and systems for determining a critical dimension and a thin film characteristic of a specimen 148 2001
7,751,046 Methods and systems for determining a critical dimension and overlay of a specimen 7 2003
6,818,459 Methods and systems for determining a presence of macro defects and overlay of a specimen 24 2003
7,460,981 Methods and systems for determining a presence of macro and micro defects on a specimen 1 2004
7,515,253 System for measuring a sample with a layer containing a periodic diffracting structure 7 2006
8,179,530 Methods and systems for determining a critical dimension and overlay of a specimen 2 2010
 
NOVA MEASURING INSTRUMENTS LTD. (16)
6,603,529 Monitoring apparatus and method particularly useful in photolithographically processing substrates 10 2000
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7,289,190 Monitoring apparatus and method particularly useful in photolithographically 2 2006
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7,595,896 Thin films measurement method and system 1 2008
7,791,740 Method and system for measuring patterned structures 0 2009
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7,864,343 Method and system for measuring patterned structures 1 2009
8,023,122 Method and system for measuring patterned structures 0 2010
7,864,344 Method and system for measuring patterned structures 0 2010
 
TOKYO ELECTRON LIMITED (13)
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5,818,596 Film thickness measuring apparatus 13 1997
5,968,691 Method and apparatus for coating resist and developing the coated resist 63 1998
6,266,125 Resist processing method and apparatus 24 1999
6,051,349 Apparatus for coating resist and developing the coated resist 33 1999
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6,457,882 Substrate processing method and substrate processing apparatus 8 2001
6,541,170 Resist processing method controlled through reflectivity data 14 2001
6,999,164 Measurement system cluster 1 2002
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MICRON TECHNOLOGY, INC. (12)
6,075,606 Endpoint detector and method for measuring a change in wafer thickness in chemical-mechanical polishing of semiconductor wafers and other microelectronic substrates 39 1998
6,642,155 Method for applying a fluid to a rotating silicon wafer surface 3 1998
6,893,504 Multi-port chemical dispense 0 1999
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7,182,669 Methods and systems for planarizing workpieces, e.g., microelectronic workpieces 2 2004
7,229,338 Apparatuses and methods for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies 1 2005
7,604,527 Methods and systems for planarizing workpieces, e.g., microelectronic workpieces 1 2007
 
GLOBALFOUNDRIES INC. (10)
5,943,550 Method of processing a semiconductor wafer for controlling drive current 43 1996
6,259,521 Method and apparatus for controlling photolithography parameters based on photoresist images 69 1999
6,479,309 Method and apparatus for determining process layer conformality 18 2001
6,537,833 Method and apparatus for characterizing an interconnect structure profile using scatterometry measurements 16 2001
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ADVANCED MICRO DEVICES, INC. (7)
6,376,013 Multiple nozzles for dispensing resist 25 1999
6,592,932 Nozzle arm movement for resist development 1 2001
6,980,300 Method and apparatus for generating a polishing process endpoint signal using scatterometry 2 2001
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6,639,663 Method and apparatus for detecting processing faults using scatterometry measurements 7 2001
6,458,605 Method and apparatus for controlling photolithography overlay registration 54 2001
6,660,539 Methods for dynamically controlling etch endpoint time, and system for accomplishing same 2 2001
 
KABUSHIKI KAISHA TOSHIBA (6)
6,191,397 Heating device, method for evaluating heating device and pattern forming method 13 1999
6,441,351 Heating device, method for evaluating heating device and pattern forming method 7 2000
6,603,101 Heating device, method for evaluating heating device and pattern forming method 4 2002
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8,071,157 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus 1 2007
7,799,368 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus 0 2007
 
APPLIED MATERIALS, INC. (4)
6,747,734 Apparatus and method for processing a microelectronic workpiece using metrology 6 2000
7,264,698 Apparatus and methods for electrochemical processing of microelectronic workpieces 4 2001
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ROUND ROCK RESEARCH, LLC (4)
6,428,386 Planarizing pads, planarizing machines, and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies 48 2000
6,609,947 Planarizing machines and control systems for mechanical and/or chemical-mechanical planarization of micro electronic substrates 69 2000
6,447,369 Planarizing machines and alignment systems for mechanical and/or chemical-mechanical planarization of microelectronic substrates 71 2000
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SEMITOOL, INC. (4)
7,267,749 Workpiece processor having processing chamber with improved processing fluid flow 2 2003
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KLA-TENCOR CORPORATION (3)
6,812,045 Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation 32 2001
7,859,659 Spectroscopic scatterometer system 1 2006
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DAINIPPON SCREEN MFG. CO., LTD. (2)
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EASTMAN KODAK COMPANY (1)
6,035,148 Shuttering system for a sensitometer 3 1998
 
HITACHI KOKUSAI ELECTRIC INC. (1)
6,555,421 Method and apparatus for manufacturing semiconductor device 1 2001
 
LSI LOGIC CORPORATION (1)
5,717,490 Method for identifying order skipping in spectroreflective film measurement equipment 6 1996
 
MITSUBISHI DENKI KABUSHIKI KAISHA (1)
5,591,654 Method of manufacturing a semiconductor device and a resist composition used therein 9 1994
 
NEC CORPORATION (1)
6,251,487 Method for coating a resist film 6 1999
 
RUDOLPH TECHNOLOGIES, INC. (1)
6,519,045 Method and apparatus for measuring very thin dielectric film thickness and creating a stable measurement environment 15 2001
 
SAMSUNG ELECTRONICS CO., LTD. (1)
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SHARP KABUSHIKI KAISHA (1)
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TOKYO OHKA KOGYO CO., LTD. (1)
7,147,984 Positive-working chemical-amplification photoresist composition 1 2004
 
UNIVERSITY OF MARYLAND, BALTIMORE (1)
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OTHER [CHECK PATENT PROFILE FOR ASSIGNMENT INFORMATION] (1)
6,881,444 Process for fabricating monolayer/multilayer ultrathin films 4 2002