Magnetic disk having a sputtered hydrogen-doped carbon protective film
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United States of America Patent
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Mar 14, 1995
Issued Date -
N/A
app pub date -
May 3, 1993
filing date -
Feb 1, 1990
priority date (Note) -
Expired
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Abstract
A carbon film for protecting a magnetic disk is sputtered in the presence of hydrogen. If a sufficient amount of hydrogen is present in the sputtering chamber, the resulting carbon film will exhibit superior mechanical characteristics, i.e. an enhanced wear resistance during a contact-start-stop or drag test in a disk drive. Sputtering in the presence of hydrogen can be accomplished by either DC or RF magnetron sputtering, or DC or RF diode sputtering.
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