Alignment system for a Half-Field Dyson projection system

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United States of America Patent

PATENT NO 5402205
SERIAL NO

07993795

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Abstract

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An alignment system for a unit magnification system (such as a Half-Field Dyson system) for use in microlithography is provided. The alignment system provides for aligning a pattern on a reticle with a complementary pattern on a wafer.

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Patent Owner(s)

Patent OwnerAddress
ULTRATECH STEPPER INC3050 ZANKER ROAD SAN JOSE CA 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Alonzo, Gerald J Los Gatos, CA 7 39
Jeong, Hwan J Los Altos, CA 34 679
Markle, David A Saratoga, CA 73 2112

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