Method and apparatus for vapor deposition of diamond
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 4, 1995
Issued Date -
N/A
app pub date -
Jun 29, 1992
filing date -
Apr 3, 1987
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for a vapor deposition of diamond by: effecting an arc discharge while feeding a discharge gas between an anode and a cathode of a thermal plasma chemical vapor deposition device; radicalizing a gaseous carbon compound by feeding the gaseous carbon compound to a generated plasma jet; and permitting said radicalized plasma jet to impinge on a substrate to be treated, whereby a film of diamond is formed on said substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully