Photolithographic and electron beam lithographic fabrication of micron and submicron three-dimensional arrays of electronically conductive polymers
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United States of America Patent
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Apr 4, 1995
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N/A
app pub date -
Jan 31, 1992
filing date -
Aug 30, 1988
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Abstract
The present invention relates to a method to produce a thin film three dimensional microelectrode of an electrically conductive polymer having an organized array of identical microprotrusions, which method comprises: (a) depositing at least one conductive metal thin film on an essentially smooth substrate, (b) depositing a thin film of a micropositive photoresist on the surface of the at least one conductive metal thin film, (c) subjecting the combination of step (b) to photolithographic or electron beam lithographic conditions with a mask capable of producing a metallic microwell, (d) electrochemically polymerizing an electrically conductive polymer onto the conducting metal, (e) removing the photoresist to produce the three dimensional microelectrode array of the electrically conductive polymer. Preferred electrically conductive polymers of step (d) are selected from polypyrrole or polyaniline. The methods wherein in step (d) the polymer is electrochemically polymerized using a constant current, or in step (d) the polymer is electrochemically polymerized using a constant potential, or in step (d), the polymer is electrochemically polymerized using a cyclic potential are preferred.
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