Gas absorption additives for electrophoretic suspensions

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5411656
SERIAL NO

08106395

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

An electrophoretic suspension prepared in accordance with the present invention comprises a dielectric fluid having suspended therein a plurality of pigment particles movable between the electrodes of an EPID device in response to an electric potential applied thereto and an effective amount of at least one additive for chemically absorbing at least one gas in the fluid. To absorb hydrogen gas in the dielectric fluid, a hydrogen absorbing additive is dispersed therein. The molecule of the hydrogen absorbing additive has an aromatic C/H ratio of 1/0.8 or less, and preferably between 1/0.67 and 1/0.75. To absorb chlorine gas in the dielectric fluid, an effective amount of an chlorine gas absorbing compound is also preferably added thereto. The chlorine gas absorbing additive comprises a molecule having at least one double bond and may be a sterically strained alkene such 5-ethylidene-2-norbornene.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
AU OPTRONICS CORPORATIONNO 1 LI-HSIN RD II SCIENCE-BASED INDUSTRIAL PARK HSINCHU

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Schubert, Frederic E Shoreham, NY 18 1639

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation