Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
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United States of America Patent
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May 23, 1995
Grant Date -
N/A
app pub date -
Nov 10, 1993
filing date -
Nov 10, 1993
priority date (Note) -
Expired
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Abstract
A method useful for stereolithography that yields enhanced photospeed, as well as a photocurable polymer composition well adapted for use with same, are disclosed. A preferred combination includes 1,2-dimethoxy-2-phenyl acetophenone, benzophenone, and triphenyl phosphine combined with a polyurethane (meth)acrylate oligomer.
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