Projection exposure apparatus and semiconductor device manufacturing method
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United States of America Patent
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Jun 13, 1995
Issued Date -
N/A
app pub date -
Sep 26, 1994
filing date -
Aug 9, 1991
priority date (Note) -
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Abstract
A projection exposure apparatus includes an illumination optical system for constituting illumination source for illuminating an original having an exposure pattern, the illumination optical system including changing mechanism for changing a shape of the illumination source; a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; an adjuster responsive to the changing mechanism to adjust the projection optical system.
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