Vacuum creating method and apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO

5426865

SERIAL NO

08115550

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A vacuum creating method comprising preparing a chamber for forming a space which can be made so atmospheric and vacuous as to allow a substrate to be directly or indirectly carried in and out of the space, exhausting the chamber, filling the space in the chamber with a CO.sub.2 gas whose vapor pressure becomes larger than 1 atm at ambient temperature but smaller than 10 Torr at a temperature lower than the ambient temperature, carrying the substrate into the chamber, cooling the CO.sub.2 gas to solidify, thereby making an internal pressure in the chamber highly vacuous, carrying the substrate out of the chamber, and heating the solidified dry ice to vaporize thereby returning the internal pressure in the chamber to atmospheric pressure.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO5246

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ikeda, Towl Yamanashi, JP 14 383
Iwata, Teruo Nirasaki, JP 29 634

Cited Art Landscape

Patent Info (Count) # Cites Year
 
TOKYO ELECTRON LIMITED (3)
* 5237756 Method and apparatus for reducing particulate contamination 10 1990
* 5314541 Reduced pressure processing system and reduced pressure processing method 53 1992
* 5240556 Surface-heating apparatus and surface-treating method 43 1992
 
Interface Technical Laboratories Co., Ltd. (1)
* 5222307 Drying method and apparatus therefor 11 1991
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
ADVANCED MICRO DEVICES, INC. (1)
* 7145653 In situ particle monitoring for defect reduction 4 2000
 
KEM-TEC Japan Co., Ltd. (1)
* 6151796 Substrate drying device, drying method and substrate dried by the same 5 1998
 
APPLIED MATERIALS, INC. (1)
* 6263587 Degassing method using simultaneous dry gas flux pressure and vacuum 13 2000
 
DAINIPPON SCREEN MFG. CO., LTD. (1)
* 2006/0174,981 Heat treatment apparatus 1 2006
 
GLOBALFOUNDRIES INC. (2)
* 8002025 Containment of a wafer-chuck thermal interface fluid 0 2006
* 2007/0252,610 CONTAINMENT OF A WAFER-CHUCK THERMAL INTERFACE FLUID 1 2006
 
TEXAS INSTRUMENTS INCORPORATED (2)
* 5551165 Enhanced cleansing process for wafer handling implements 28 1995
* 6096100 Method for processing wafers and cleaning wafer-handling implements 10 1997
 
BLUESHIFT TECHNOLOGIES, INC. (4)
* 2005/0223,837 Methods and systems for driving robotic components of a semiconductor handling system 28 2004
* 2005/0113,964 Sensor methods and systems for semiconductor handling 16 2004
* 2005/0113,976 Software controller for handling system 22 2004
* 2005/0111,956 Methods and systems for reducing the effect of vibration in a vacuum-based semiconductor handling system 14 2004
 
BROOKS AUTOMATION, INC. (13)
7458763 Mid-entry load lock for semiconductor handling system 22 2004
7422406 Stacked process modules for a semiconductor handling system 24 2004
* 7210246 Methods and systems for handling a workpiece in vacuum-based material handling system 22 2004
* 2005/0120,578 Methods and systems for handling a workpiece in vacuum-based material handling system 14 2004
* 2005/0111,938 Mid-entry load lock for semiconductor handling system 17 2004
8439623 Linear semiconductor processing facilities 1 2006
7959403 Linear semiconductor processing facilities 8 2007
* 2008/0085,173 LINEAR SEMICONDUCTOR PROCESSING FACILITIES 11 2007
8672605 Semiconductor wafer handling and transport 1 2008
8500388 Semiconductor wafer handling and transport 3 2008
7988399 Mid-entry load lock for semiconductor handling system 5 2008
8807905 Linear semiconductor processing facilities 0 2011
8944738 Stacked process modules for a semiconductor handling system 0 2011
 
AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. (1)
* 6831022 Method and apparatus for removing water vapor as a byproduct of chemical reaction in a wafer processing chamber 0 2003
 
LG ELECTRONICS INC. (2)
8758513 Processing apparatus 0 2006
* 2007/0137,793 Processing apparatus 1 2006
* Cited By Examiner