Thin film DC plasma processing system
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United States of America Patent
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Jun 27, 1995
Grant Date -
N/A
app pub date -
Dec 30, 1992
filing date -
Dec 30, 1992
priority date (Note) -
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Abstract
An enhanced DC plasma processing system which acts to immediately stop current from flowing through the plasma allows a variety of alternative embodiments for varying applications. In one embodiment, a tapped inductor is switched to ground to achieve substantial voltage reversal of about 10% upon detection of an arc condition through voltage and/or rate of voltage change techniques. This reversal of voltage is maintained long enough to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically applying a reverse voltage is effected through a timer system in the power supply.
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