Thermal control line for delivering liquid to a point of use in a photolithography system
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United States of America Patent
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-
Jun 27, 1995
Grant Date -
N/A
app pub date -
Jul 16, 1993
filing date -
Jul 16, 1993
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus and method for dispensing liquid at a controlled temperature in a spin coating or developer machine are disclosed. The apparatus is a thermal control line that has an inner core wall that encloses at least one conduit for a liquid dispense line and an outer annular wall that encloses at least one chamber for circulation of coolant. The inner core wall and the outer annular wall are formed of such materials as to permit efficient heat exchange between the coolant and the liquid. The coolant is circulated in the annular chamber at a rate sufficient to maintain the dispensed liquid at a desired temperature.
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