Deposition of diamond-like films by ECR microwave plasma

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United States of America Patent

PATENT NO 5427827
SERIAL NO

07888411

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Abstract

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Hard amorphous hydrogenated carbon, diamond-like films are deposited using an electron cyclotron resonance microwave plasma with a separate radio frequency power bias applied to a substrate stage. The electron cyclotron resonance microwave plasma yields low deposition pressure and creates ion species otherwise unavailable. A magnetic mirror configuration extracts special ion species from a plasma chamber. Different levels of the radio frequency power bias accelerate the ion species of the ECR plasma impinging on a substrate to form different diamond-like films. During the deposition process, a sample stage is maintained at an ambient temperature of less than 100.degree. C. No external heating is applied to the sample stage. The deposition process enables diamond-like films to be deposited on heat-sensitive substrates.

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THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATIONWASHINGTON D C COLUMBIA WASHINGTON D C WASHINGTON D C

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Pool, Frederick S Pasadena, CA 1 23
Shing, Yuh-Han Thousand Oaks, CA 6 319

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