Sputtering apparatus, device for exchanging target and method for the same
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United States of America Patent
Stats
-
Jul 4, 1995
Grant Date -
N/A
app pub date -
Nov 21, 1990
filing date -
Nov 29, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In accordance with the present invention, in order to exchange a target under a vacuum condition without communicating a film-forming chamber with the atmosphere for exchange of the target, a substrate is located in a vacuum vessel and an opening portion is provided on a wall surface of the vacuum vessel opposite to the substrate which is formed with a thin film on its surface. A target exchanging chamber is disposed adjacent to the vacuum vessel so as to be communicated therewith through the opening portion. During film-formation, the interior of the vacuum vessel is maintained in a vacuum state by closing the opening portion with the target while the target exchanging chamber is communicated with the atmosphere and a spare target is contained therein. When exchanging the target, the air in the target exchanging chamber is exhausted to maintain the chamber in a vacuum state and the target is replaced with the spare target.
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