Projection exposure apparatus and polarizer
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 25, 1995
Issued Date -
N/A
app pub date -
Aug 26, 1994
filing date -
Feb 10, 1992
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A projection exposure apparatus includes a light source, a condenser lens for condensing an illumination light emanating from the light source onto a mask including a circuit pattern, a projection lens for condensing onto a surface of a wafer the illumination light that has passed through the mask, and a polarizer disposed on a surface of a pupil of the projection lens for converting the illumination light converged onto the surface of the wafer into polarized light having radial planes of polarization intersecting the optical axis of the projection lens.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully