Process for laminating photosensitive layer

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United States of America Patent

PATENT NO 5437960
SERIAL NO

08286457

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Abstract

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A process for laminating a photosensitive-layer which includes providing (A) a base having a laminating region and a non-laminating region, and (B) a support having thereon, in order, a photosensitive layer and a protective film, where part of the protective film corresponds to the laminating region and part of the protective film corresponds to the non-laminating region, removing the part of the protective film which corresponds to the laminating region from the photosensitive layer such that the photosensitive layer can be laminated to the base in the laminating region, feeding the base and the support having thereon the photosensitive layer from which protective film has been removed to a nip between a pair of heated pressure rollers, passing the base and photosensitive-layer-covered support forward through the rollers while the base and photosensitive-layer-covered support are being nipped and hot-pressed by the rollers, with the photosensitive layer being in contact with the laminating region of the base to laminate the photosensitive layer to the base, and then peeling the support from the photosensitive layer, wherein the removal of protective film from the photosensitive layer is conducted in such a manner that the part of the protective film which corresponds to the non-laminating region of the base is left on the photosensitive layer.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 1068620 ?1068620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Endo, Hiroya Shizuoka, JP 11 238
Miyata, Ken-ichi Shizuoka, JP 1 28
Nagate, Hiroshi Shizuoka, JP 21 225

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