Stereolithography using vinyl ether-epoxide polymers

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United States of America Patent

PATENT NO 5437964
SERIAL NO

08201146

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Abstract

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Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing vinyl ether functionalized compounds and epoxy functionalized compounds plus an effective amount of a cationic photoinitiator.

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Patent Owner(s)

  • 3D SYSTEMS, INC.;HUNTSMAN ADVANCED MATERIALS AMERICAS INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Barnes, Darryl K Bellwood, IL 7 122
Green, George D Park Ridge, IL 44 373
Lapin, Stephen C Wauconda, IL 36 498
Sitzmann, Eugene V Des Plaines, IL 10 220
Snyder, James R Chicago, IL 11 302

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