Concentration measurement and control of hydrogen peroxide and acid/base component in a semiconductor bath
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United States of America Patent
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Aug 8, 1995
Issued Date -
N/A
app pub date -
Jul 20, 1994
filing date -
Feb 12, 1993
priority date (Note) -
Expired
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Abstract
A feedback control system for providing automated control of multi-component chemical concentrations in a hydrogen peroxide/ammonia (SC-1) aqueous bath or in a hydrogen peroxide/hydrochloric (SC-2) aqueous bath used for semiconductor processing. A sample from the liquid bath is routed to two sensors. Three separate schemes for determining concentrations of the two chemicals in the bath are provided by the selection of one of three separate pairs of sensors. A processor is used to monitor and control the chemical makeup of the bath.
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